Wavelength | 520 nm, 660 nm |
Output power (max.) | 50 mW or 130 mW |
min. Line thickness (typ. @300 mm Abstand) | 100 μm |
Line homogeneity | ± 20 % |
Line versions | Thin line or high depth of focus |
Focus distances typically | 300 mm – 1.000 mm |
Laser protection class | 3B |
Wavelength | 405 nm, 450 nm, 520 nm, 660 nm (Δ𝜆 max. 10 nm), Additional on request |
Output power (max.) | 85 mW (405 nm), 50 mW (450 nm), 80 mW (520 nm), 85 mW (660 nm), hom. line, Additional on request |
Beam adjustment | Standard: 300 mm (focussed), additional on request |
Operation temperature | 0°C bis +60°C |
Storage temperature | -40°C bis +70°C |
Harsh environment
Measurement systems
Wavelength | 520 nm, 660 nm |
Optical output rating | 35 mW (520 nm)/60 mW (660 nm) |
Casing dimensions | 25.5 mm x 25.5 mm x 35 mm |
Line options | Collimated/focused |
Line length (1 m spacing) | 1.3 m |
Line width (collimated/focused @0.5 m, @1 m, @1.5 m) | 1 mm – 2 mm/0.45 mm, 0.75 mm, 1 mm |
Laser protection class | 1 – 3B |